Photomask is a photographic
pattern, used to make microcircuit and ultraviolet light. These lights are
shined through the mask on to a photoresist to transfer the pattern. These
photomasks are used to manufacture components for instance display devices,
micro-electromechanical system (MEMS), discrete semiconductor components, and standalone
printed circuit board (PCB). In addition, the photomask has numerous
applications, some of them are used to support consumers’ microlithography
process as a midway step between production of photonics, ICs, and MEMS
devices. The photomasks are extensively used to develop devices for computer
& peripherals, automotive product, military product, consumer product, and
biomedical & medical products. Moreover, photomask encompasses the pattern
of integrated circuits, and they have become smaller & more complex to
accurately transfer the pattern to silicon wafer.
According to study, “Photomask
Market by Product (Reticle, Master Mask, and Others), Mask Shop Type
(Captive Mask and Merchant Mask) and Application (Optical Devices, Discrete
Components, Displays, MEMS, and Others): Global Opportunity Analysis and
Industry Forecast, 2019-2026”. Some of the key companies operating in the
global photomask market are Applied Materials, Inc., Advanced Reproductions
Corporation, SK-Electronics Co. Ltd., Photronics Inc., Infinite Graphics
Incorporated, Taiwan Mask Corporation (TMC), LG Innotek, Compugraphics
Photomask Solutions, HTA Photomask, Nippon Filcon Co. Ltd., and Hoya
Corporation. Key vendors are anticipated to witness substantial challenges to
their growth owing to the rapid technological advances and cyclical nature of
the semiconductor industry.
Based on type, photomask market is
segmented into working mask, copy mask, reticle and master mask. Based on
equipment, market is segmented into inspection equipment and photomasking
equipment. Photomasking segment is estimated to exhibit considerable growth
rate due to large-scale production & sales of wireless computing and
communication devices during the forecast period. Based on mask shop type,
market is segmented into merchant and captive. Based on application, market is
segmented into discrete, display devices, optoelectronics, semiconductor &
IC and others. In addition, based on end-user, market is segmented into
electronics & semiconductors, research & development, chemical etching
manufacturing, healthcare & pharma, automotive, aerospace, microfluidics,
and others.
The photomask market is driven by
increase in usage of automated systems across various industry verticals,
followed by rise in demand for high density chip, growth in adoption of
consumer electronic products and rise in demand of the semiconductors. However,
high product cost and complexity related to photomask manufacturing process may
impact the market. Moreover, increase in focus towards advancements in
technologies such as Internet-of-Things (IoT) is a key opportunity for market.
Based on geography, the
Asian-Pacific is a leading region in global photomask market owing to increase
in adaptation of advanced photomasks in semiconductor & electronics
industry in the region. Whereas, the North-Americana and European regions are
expected to exhibit substantial growth rate due to growth in development of
chips with high circuit density over the forecast period. In upcoming years, it
is anticipated that future of the market will be optimistic because of growth
in automation in semiconductor & electronics industry along with increase
in technological advancements in semiconductor industry during the forecast
period.
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