Atomic Layer Deposition (ALD) is a process that enables the deposition of thin films of a wide variety of materials on any substrate. In the ALD process, a substrate surface is exposed to alternating precursors that don’t overlap but are introduced one after the other. For the production of thin films, ALD makes it indispensable in products such as displays, data storage devices and small electronic components. Atomic Deposition Layer is used to create a protected thin film layer on any material or product, depending on the material or product that layer requires.
Referring
to the study, Global
Atomic Layer Deposition Equipment (ALD) Industry Research Report 2021 Segmented
by Major Market Players, Types, Applications and Countries Forecast to 2027.
Some of the key companies operating in the global atomic layer deposition
equipment market include Veeco Instruments, Aixtron, CVD Equipment, Entegris,
Encapsulix, Ultratech, Arradiance, Tokyo Electron, Beneq, Lotus Applied
Technology, NCD, Applied Materials, Picosun, Sentech Instruments, ASM
International, Kurt J. Lesker Company, ALD Nanosolutions, Oxford Instruments
and among others. Market players in this region are sharply invested in
research and development programs to improve the efficiency of their results and
lead the faster market expansion globally.
Based
on types, Atomic
Layer Deposition Equipment Market can be segregated as metal ALD,
catalytic ALD, aluminum oxide ALD and others. The aluminum oxide ALD segment
dominates the global market owing to easy availability of aluminum and rise in demand
for aluminum oxide films that use ALD deposition technique. In addition, based
on application types, market can be segregated as Integrated Circuit (IC)
Applications, Semiconductor & Electronics, Solar Panels, Sensors, Barrier
Layers, Display Panels and others.
Growth
of the solar power industry, followed by rise in demand for ALD equipment in
nanotechnology, increase in number of connected devices, rise in use of
component miniaturization in the electronic devices, expansion of various end
use industries, rise in the demand for electronic components in the automotive
industry, growth in electronics industry & semiconductor solutions, rapid
industrialization and inclusion of ALD technique for conducting the manufacturing
process of small components at low-cost in various industries are some major
factors, which are responsible for growth of the atomic layer deposition
equipment market. Apart from this, high investment required for R&D may
impact the market. Furthermore, growth in advancements in the technology is a
leading opportunity for global market.
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Based
on regional analysis, the Asia-Pacific is a leading region in global atomic
layer deposition equipment market owing to increase in concerns for global
warming climate change and rise in demand from end-use industries like
electronics, semiconductors and medical equipment industry across the region.
The North-America and Europe regions are anticipated to witness higher growth
rate due to presence of a large number of automotive manufacturers coupled with
increase in government regulatory support to encourage the domestic-level
private investment over the forecast period. It is projected that future of the
global atomic layer deposition equipment market will be bright on account of
rise in demand for miniaturized electronics & equipment and surge in demand
for storage devices during the forecast period.
For More Information, refer
to below link:-
Atomic
Layer Deposition Equipment Market Growth
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