High-k is a material having a high dielectric constant and threshold for the comparison being the dielectric constant of the silicon dioxide, it has been also been for decades and is a de-facto material used for the gate dielectric layer of the device. The High-k dielectrics is commonly used in the process of semiconductor manufacturing, with a strategy well known to come over a use for allowing further reduction in size of the microelectronic components.
The Atomic layer deposition (ALD) and chemical
vapor deposition (CVD) are thin films used for depositing techniques, with the
ALD often being considered as a sub-set of CVD and the techniques depending on
the sort of chemical reaction between substrate and material deposited.
Further, these processes are often being used over the production of thin films
in the semiconductor industry. The ALD method is widely used for depositing the
multi-component thin films by co-injecting the precursors such as Hf and Si
forming a single layer, homogenous film used for several applications
According to study, “Global High-k and ALD/CVD metal precursors Market to reach USD 952.73 million by 2026” the key companies operating in the global High-k and ALD/CVD metal precursors market are Air Products and Chemicals, Inc., Adeka Corporation, Merck Group, SAFC Hitech (Sigma-Aldrich Corporation) (Acquired by Merck KGaA), Dynamic network Factory, UP Chemical Co. Ltd., DOWDUPONT, Nanmat Technology Co. Ltd., JSR Corporation, TANAKA KIKINZOKU, Praxair Inc.
Based on product type, High-k and ALD/CVD
metal precursors market is segmented as capacitor/memory, interconnect, gates
and others. The interconnect is a fabrication technique that widely uses Copper
(Cu) or Aluminum (Al) for patterning the metals as well as designed to
introduce the barrier metal layers in order to protect the Silicon (Si) from
the potential damage over an Integrated Circuit (IC). In addition, based on
application, market is segmented as semiconductor industry and
non-semiconductors arenas.
The High-k and ALD/CVD metal precursors market
is driven by increase in applications of high-k materials in LEDs, followed by
rise in demand in nanotechnology applications and growth in demand for improved
semiconductor devices. However, risks associated with higher impurity levels
may impact the market. Moreover, extensive research & development (R&D)
and government policies supporting semi-conductor industry are key
opportunities for market.
Based on geography, the Asian-Pacific region
holds major share in High-k and ALD/CVD metal precursors market owing to growth
in electronic industry coupled with high application potential of
semiconductors in smartphones and automotive industry in the region. Whereas,
the North-American and European regions are estimated to witness higher growth
rate due to early adoption of the technologies in countries such as Canada and
the U.S. over the forecast period. In upcoming years, it is predicted that
future of the global market as a result of continuous rise in demand for
miniaturized semiconductor device during the forecast period. The global High-k
and ALD/CVD metal precursors market is valued approximately US $528.99 million
in 2018 and is expected to grow with a healthy growth rate of more than 7.83 %
over the forecast period 2019 to 2026.
For More Information, Click on the Link Below:-
Global
High-k and ALD/CVD metal precursors Market
Contact Us:-
Ken Research
Ankur Gupta, Head Marketing &
Communications
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